Mass-Selected Ion Deposition System - Electrospray Source
Quick Specs
- Allows control of soft landing energies of 0-500 eV
- Allows control of spot size of 5 mm to 1 mm in diameter
The mass-selected ion deposition system is a new instrument constructed at EMSL. The apparatus, shown in Figure 1, includes a high-transmission electrospray ion source, quadrupole mass filter, bending quadrupole that deflects the ion beam and prevents neutral molecules originating in the ion source from impacting the surface, an ultrahigh vacuum (UHV) chamber for ion deposition by soft landing, and a vacuum-lock system for introducing surfaces into the UHV chamber without breaking vacuum. Its design allows us to control soft landing energies (0-500 eV) and spot sizes from around 5 mm down to 1 mm in diameter. Phosphorus screen detector is used to monitor the spot size prior to ion deposition.
Research applications include:
- Controlled highly specific deposition of complex ions on surfaces
- Covalent immobilization of mass-selected ions on a variety of surfaces
- Preparation of novel catalysts using soft-landing of mass-selected ions
All Related Publications Related Publications
- Effect of the Surface on Charge Reduction and Desorption Kinetics of Soft Landed Peptide Ions.
- Reactive Landing of Peptide Ions on Self-Assembled Monolayer Surfaces: A Alternative Approach for Covalent Immobilization of Peptides on Surfaces.
- Soft-Landing of Peptide IOns Onto Self-Assembled Monolayer Surfaces: an Overview.
- Helical Peptide Arrays on Self-Assembled Monolayer Surfaces Through Soft and Reactive Landing of Mass-Selected Ions.
- Charge Retention by Peptide Ions Soft-Landed onto Self-Assembled Monolayer Surfaces.
